High aspect ratio etching and characterization of 2D-photonic crystals in InP/InGaAsP/InP heterostructures

S. Anand, M. Qiu, M. Mulot, M. Swillo, B. Jaskorzynska, A. Karlsson

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

We report on the fabrication and characterization of 2D photonic crystals (PhCs) in InP/InGaAsP/InP heterostructures. It is demonstrated that Ar/Cl2 based chemically assisted ion beam etching (CAIBE) is a very promising method to obtain high aspect ratio etching of PhCs in the InP-based materials. With this process, it is possible to obtain PC-holes as deep as 3 microns even for feature (PhC-hole) sizes as small as 200-250 nm. The optical characteristics of the fabricated PhC-based elements/devices such as line-defect waveguides, in-plane resonant cavities and drop-filter based on contra-directional coupling will be reported. The devices were measured using end-fire coupling and the obtained results were simulated using the 2D finite difference time domain (FDTD) method including an effective loss-approximation. The etched PhC-waveguides show low transmission losses, less than 1 dB/100 μm. A quality factor of 400 for a 6 micron long cavity with 6-hole mirrors is obtained. Finally, drop-functionality in a PhC-based filter using contra-directional coupling is demonstrated.

Original languageEnglish
Pages (from-to)78-89
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5277
DOIs
StatePublished - 2004
Externally publishedYes
EventPhotonics: Design, Technology, and Packaging - Perth, WA, Australia
Duration: Dec 10 2003Dec 12 2003

Keywords

  • Chemically assisted ion beam etching
  • Drop filters
  • InP
  • Optical cavities
  • Optical filters
  • Photonic crystal waveguides
  • Photonic crystals
  • Reactive ion beam etching

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